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InN nanostructures with surface electron accumulation as an alternate for low loss plasmonic materials in the UV visible region

机译:InN纳米结构与表面电子积累作为替代   用于紫外可见区域中的低损耗等离子体材料

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摘要

Recently, heavily doped semiconductors are emerging as an alternate for lowloss plasmonic materials; however, surface plasmon resonance of these materialsin the visible region is difficult to achieve. InN, belonging to the group IIInitrides, possesses the unique property such as surface electron accumulationnear the surface region. In this report, for the first time, we demonstratedthe surface plasmon properties of InN nanoparticles, as a result of surfaceelectron accumulation, using the real space mapping of the surface plasmonintensity. The surface electron accumulation is confirmed by the valence bandphotoemission, Raman and photoluminescence spectroscopic studies. The variationin the carrier density in bulk and surface region was confirmed by UV-visibleabsorption and UV photoelectron spectroscopy, respectively. The surface plasmonprofiles were tuned with the variation of the sheet carrier density ofaccumulated electrons on surface, which were readily varied using the growthparameters such as the growth temperature. The localized surface plasmonresonance and the propagating surface plasmon polaritons are observed in the UVto visible region (200 to 400 nm), indicating InN as a promising alternate forthe low loss plasmonic material in the visible region.
机译:最近,重掺杂半导体正在替代低损耗等离子体材料。然而,这些材料在可见光区域的表面等离子体共振很难实现。属于III族氮化物的InN具有独特的性质,例如在表面区域附近的表面电子积累。在本报告中,我们首次使用表面等离激元强度的真实空间映射,证明了由于表面电子积累而导致的InN纳米粒子的表面等离激元特性。价带光发射,拉曼光谱和光致发光光谱研究证实了表面电子的积累。分别通过UV-可见吸收和UV光电子能谱确认了载流子密度在体和表面区域中的变化。表面等离子体轮廓通过表面上累积的电子的薄层载流子密度的变化来调节,该变化易于使用诸如生长温度的生长参数来变化。在紫外到可见光区域(200至400 nm)中观察到局部表面等离振子共振和传播的表面等离激元极化子,表明InN是可见光区域中低损耗等离激元材料的有希望的替代物。

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